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Semiconductor Cleaning Agent HFO-1233zd(Z) - Semiconductor-Grade Precision Cleaning, Sustainable & Regulatory Compliant HCFC-141B Replacement for Versatile Industrial Cleaning

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Semiconductor Cleaning Agent HFO-1233zd(Z) - Semiconductor-Grade Precision Cleaning, Sustainable & Regulatory Compliant HCFC-141B Replacement for Versatile Industrial Cleaning

Markenbezeichnung:	Chemfine
Modellnummer:	HFO-1233zd
MOQ:	1000 kg
Zahlungsbedingungen:	L/C, T/T

Ausführliche Information

Produkt-Beschreibung

Ausführliche Information

Herkunftsort:

China

Hervorheben:

Semiconductor-grade precision cleaning HFO-1233zd(Z)

Sustainable & regulatory compliant HCFC-141B Replacement

Versatile industrial cleaning solution Semiconductor Cleaning Agent

Produkt-Beschreibung

Semiconductor Cleaning Agent Replacement

HCFC-141B HFO-1233zd HFO-1336mz FS-39 Replacement HCFCs Cas 99728-16-2

Product Selling Points

Ideal HCFC-141B Replacement: Our HFO-1233zd(Z) offers equivalent cleaning performance to HCFC-141B with superior environmental profile, making it the perfect drop-in replacement for existing cleaning processes.
Semiconductor-Grade Precision Cleaning: With ultra-high purity and controlled impurity levels, our CAS 99728-16-2 is specially designed for semiconductor wafer cleaning, photoresist stripping and precision electronic component cleaning.
Sustainable & Regulatory Compliant: Zero ozone depletion potential and ultra-low global warming potential, fully compliant with the Montreal Protocol, EU F-Gas regulations and US EPA SNAP program.
Versatile Industrial Cleaning Solution: Suitable for a wide range of applications including metal degreasing, aerospace component cleaning, vapor degreasing and solvent-based cleaning systems.
Safe and Easy to Handle: Non-flammable, low toxicity, compatible with most common materials used in industrial cleaning equipment, reducing operational risks and simplifying process integration.

Product Introduction

HFO-1233zd(Z), also known as Cis-1-chloro-3,3,3-trifluoropropene, is identified by CAS Number 99728-16-2. It is a next-generation, eco-friendly hydrofluoroolefin (HFO) solvent, specially developed as a high-performance replacement for HCFC-141B, HFO-1336mz, FS-39 and other ozone-depleting HCFCs and high-GWP fluorinated solvents.

With zero ozone depletion potential (ODP), ultra-low global warming potential (GWP) and excellent solvency power, HFO-1233zd(Z) has become the preferred cleaning agent for the semiconductor and electronics manufacturing industry. It is widely used in precision cleaning, vapor degreasing, photoresist residue removal and other critical industrial cleaning processes, delivering reliable cleaning performance while helping manufacturers meet global environmental regulations.

Detailed Applications

Semiconductor & Electronics Manufacturing

Primary use for precision cleaning of semiconductor wafers, removing photoresist residues, organic contaminants and fine particles from wafers and electronic components; ideal for cleanroom-grade cleaning processes.

Industrial Vapor Degreasing

Used in vapor degreasing systems for metal, plastic and ceramic components, effectively removing oils, greases, flux residues and machining fluids.

Aerospace & Precision Engineering

For cleaning high-precision aerospace components, optical parts and medical devices, ensuring zero residue and high cleanliness standards.

Refrigeration & Foam Blowing Auxiliary

Also used as a low-GWP blowing agent for polyurethane foams and as a component in low-GWP refrigerant blends.

General Industrial Cleaning

Suitable for heavy-duty degreasing, circuit board cleaning and other industrial cleaning applications requiring high solvency and environmental compliance.

Basic Physical Properties

Property	Value/Description
CAS Number	99728-16-2
Chemical Name	Cis-1-chloro-3,3,3-trifluoropropene (HFO-1233zd(Z))
Molecular Formula	(Z)-CF3CH=CHCl
Molecular Weight	130.5 g/mol
Boiling Point (1 atm)	39.0 °C
Melting Point	-101.0 °C
Liquid Density (20°C, 760 mmHg)	1.312±0.06 g/cm³
Viscosity at 25°C	0.37 mPa·s
Vapor Pressure at 20°C	49 kPa
Water Solubility	950 ppm
Flash Point	None
KB Value	34

Technical Specifications

ITEM	SPECIFICATION	STANDARD RESULT
Purity (Wt%)	≥99.8	≥99.8
Moisture (Wt%)	≤0.002	≤0.002
Acidity (as HCl, Wt%)	≤0.0001	≤0.0001
Evaporation Residue (Wt%)	≤0.01	≤0.01
Chloride Test	Pass	Pass

Specialized Applications

Semiconductor Wafer Cleaning

Our HFO-1233zd(Z) is specially formulated for the strict requirements of semiconductor manufacturing, effectively removing photoresist residues, organic contaminants and sub-micron particles from silicon wafers without damaging delicate wafer structures. Its ultra-high purity ensures zero contamination, making it ideal for advanced node semiconductor production.

Precision Vapor Degreasing

With a suitable boiling point and excellent solvency, HFO-1233zd(Z) is perfect for vapor degreasing systems, delivering fast, residue-free cleaning for metal, plastic and ceramic components across automotive, aerospace and electronics industries. Its non-flammable nature ensures safe operation in high-temperature degreasing equipment.

HCFC-141B & High-GWP Solvent Replacement

As a drop-in replacement for HCFC-141B, HFO-1336mz, FS-39 and other high-GWP fluorinated solvents, our HFO-1233zd(Z) maintains equivalent cleaning performance while eliminating ozone depletion risk and reducing carbon footprint, helping manufacturers smoothly transition to environmentally compliant cleaning processes without costly equipment modifications.

Packaging & Logistics

Standard Packaging: 25 kg UN-approved steel drums, 250 kg steel drums, or 1000 kg IBC totes.

Storage: Store in a cool, dry, well-ventilated warehouse. Keep away from direct sunlight, heat sources and incompatible materials.

Safety Class: Non-flammable, low-toxicity chemical, compliant with international transport regulations for hazardous goods.

Synonyms

Cis-1-chloro-3,3,3-trifluoropropene; HFO-1233zd(Z); HFO-1233zd; Z-HFO-1233zd; HCFC-141B Replacement; CAS 99728-16-2

Frequently Asked Questions

Q: Is HFO-1233zd(Z) a direct drop-in replacement for HCFC-141B?

A: Yes, HFO-1233zd(Z) has similar solvency, boiling point and material compatibility to HCFC-141B, making it a near drop-in replacement for most existing cleaning and degreasing processes, with minimal or no equipment modifications required.

Q: What is the environmental profile of HFO-1233zd(Z)?

A: HFO-1233zd(Z) has a zero ozone depletion potential (ODP) and an ultra-low global warming potential (GWP) of less than 1, making it fully compliant with the Montreal Protocol, EU F-Gas regulations and US EPA SNAP program for use as a cleaning solvent.

Q: Is HFO-1233zd(Z) flammable?

A: No, HFO-1233zd(Z) has no flash point, making it non-flammable under normal operating conditions, which significantly reduces fire hazards in industrial cleaning and manufacturing facilities.

Q: What purity grades of HFO-1233zd(Z) do you offer?

A: We offer standard industrial grade (≥99.5% purity) and electronic/semiconductor grade (≥99.8% purity) HFO-1233zd(Z), with strict control of moisture, acidity and residual impurities to meet the needs of different applications.

Umbauten:

4746-97-8

2 4 6-Tri- (6-aminocaproic Säure) - 1 Triazin 3 5

Farbenmodifizierer cas 80584-91-4

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Semiconductor Cleaning Agent HFO-1233zd(Z) - Semiconductor-Grade Precision Cleaning, Sustainable & Regulatory Compliant HCFC-141B Replacement for Versatile Industrial Cleaning

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Beschichtende Zusätze

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Verschiedene Chemikalie

Semiconductor Cleaning Agent HFO-1233zd(Z) - Semiconductor-Grade Precision Cleaning, Sustainable & Regulatory Compliant HCFC-141B Replacement for Versatile Industrial Cleaning

Markenbezeichnung:	Chemfine
Modellnummer:	HFO-1233zd
MOQ:	1000 kg
Zahlungsbedingungen:	L/C, T/T

Ausführliche Information

Produkt-Beschreibung

Ausführliche Information

Herkunftsort:

China

Markenname:

Chemfine

Modellnummer:

HFO-1233zd

Min Bestellmenge:

1000 kg

Zahlungsbedingungen:

L/C, T/T

Hervorheben:

Semiconductor-grade precision cleaning HFO-1233zd(Z)

Sustainable & regulatory compliant HCFC-141B Replacement

Versatile industrial cleaning solution Semiconductor Cleaning Agent

Produkt-Beschreibung

Semiconductor Cleaning Agent Replacement

HCFC-141B HFO-1233zd HFO-1336mz FS-39 Replacement HCFCs Cas 99728-16-2

Product Selling Points

Ideal HCFC-141B Replacement: Our HFO-1233zd(Z) offers equivalent cleaning performance to HCFC-141B with superior environmental profile, making it the perfect drop-in replacement for existing cleaning processes.
Semiconductor-Grade Precision Cleaning: With ultra-high purity and controlled impurity levels, our CAS 99728-16-2 is specially designed for semiconductor wafer cleaning, photoresist stripping and precision electronic component cleaning.
Sustainable & Regulatory Compliant: Zero ozone depletion potential and ultra-low global warming potential, fully compliant with the Montreal Protocol, EU F-Gas regulations and US EPA SNAP program.
Versatile Industrial Cleaning Solution: Suitable for a wide range of applications including metal degreasing, aerospace component cleaning, vapor degreasing and solvent-based cleaning systems.
Safe and Easy to Handle: Non-flammable, low toxicity, compatible with most common materials used in industrial cleaning equipment, reducing operational risks and simplifying process integration.

Product Introduction

Detailed Applications

Semiconductor & Electronics Manufacturing

Industrial Vapor Degreasing

Used in vapor degreasing systems for metal, plastic and ceramic components, effectively removing oils, greases, flux residues and machining fluids.

Aerospace & Precision Engineering

For cleaning high-precision aerospace components, optical parts and medical devices, ensuring zero residue and high cleanliness standards.

Refrigeration & Foam Blowing Auxiliary

Also used as a low-GWP blowing agent for polyurethane foams and as a component in low-GWP refrigerant blends.

General Industrial Cleaning

Suitable for heavy-duty degreasing, circuit board cleaning and other industrial cleaning applications requiring high solvency and environmental compliance.

Basic Physical Properties

Property	Value/Description
CAS Number	99728-16-2
Chemical Name	Cis-1-chloro-3,3,3-trifluoropropene (HFO-1233zd(Z))
Molecular Formula	(Z)-CF3CH=CHCl
Molecular Weight	130.5 g/mol
Boiling Point (1 atm)	39.0 °C
Melting Point	-101.0 °C
Liquid Density (20°C, 760 mmHg)	1.312±0.06 g/cm³
Viscosity at 25°C	0.37 mPa·s
Vapor Pressure at 20°C	49 kPa
Water Solubility	950 ppm
Flash Point	None
KB Value	34

Technical Specifications

ITEM	SPECIFICATION	STANDARD RESULT
Purity (Wt%)	≥99.8	≥99.8
Moisture (Wt%)	≤0.002	≤0.002
Acidity (as HCl, Wt%)	≤0.0001	≤0.0001
Evaporation Residue (Wt%)	≤0.01	≤0.01
Chloride Test	Pass	Pass

Specialized Applications

Semiconductor Wafer Cleaning

Precision Vapor Degreasing

HCFC-141B & High-GWP Solvent Replacement

Packaging & Logistics

Standard Packaging: 25 kg UN-approved steel drums, 250 kg steel drums, or 1000 kg IBC totes.

Storage: Store in a cool, dry, well-ventilated warehouse. Keep away from direct sunlight, heat sources and incompatible materials.

Safety Class: Non-flammable, low-toxicity chemical, compliant with international transport regulations for hazardous goods.

Synonyms

Cis-1-chloro-3,3,3-trifluoropropene; HFO-1233zd(Z); HFO-1233zd; Z-HFO-1233zd; HCFC-141B Replacement; CAS 99728-16-2

Frequently Asked Questions

Q: Is HFO-1233zd(Z) a direct drop-in replacement for HCFC-141B?

Q: What is the environmental profile of HFO-1233zd(Z)?

Q: Is HFO-1233zd(Z) flammable?

A: No, HFO-1233zd(Z) has no flash point, making it non-flammable under normal operating conditions, which significantly reduces fire hazards in industrial cleaning and manufacturing facilities.

Q: What purity grades of HFO-1233zd(Z) do you offer?

Umbauten: